Publikationen von W. Möller

Hytry, R.; Möller, W.; Wilhelm, R.: Running discharge for PECVD inner coating of metal tubes. Surface & Coatings Technology (1-3), S. 43 - 48 (1995)

Möller, W.; Fukarek, W.; Lange, K.; Keudell, A. v.; Jacob, W.: Mechanisms of the Deposition of Hydrogenated Carbon Films. Japanese Journal of Applied Physics Part 1: Regular Papers, Short Notes & Review Papers 34 (4B), S. 2163 - 2171 (1995)

Friedl, A.; Fukarek, W.; Möller, W.; Koch, A.: In situ characterization of plasma‐deposited a‐C:H thin films by spectroscopic infrared ellipsometry. Review of Scientific Instruments 65 (9), S. 2882 - 2889 (1994)

Hytry, R.; Möller, W.; Wilhelm, R.: Running waveguide discharge for inner coating of metal tubes. Applied Physics Letters 64 (25), S. 3401 - 3403 (1994)

Jacob, W.; Engelhard, M.; Möller, W.; Koch, A.: Absolute density determination of CH radicals in a methane plasma. Applied Physics Letters 64 (8), S. 971 - 973 (1994)

Keudell, A. v.; Möller, W.: A combined plasma‐surface model for the deposition of C:H films from a methane plasma. Journal of Applied Physics 75 (12), S. 7718 - 7727 (1994)

Möller, W.: Computer simulation of ion-beam assisted film growth. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 89 (1-4), S. 322 - 324 (1994)

Möller, W.: Modeling of ion-assisted deposition using BCA computer simulation. Radiation Effects and Defects in Solids 130, S. 353 - 366 (1994)

Möller, W.; Eckstein, W.: Capabilities of dynamic BCA simulations. Radiation Effects and Defects in Solids 129 (1-2), S. 19 - 23 (1994)

Hytry, R.; Möller, W.; Wilhelm, R.; Keudell, A. v.: Moving‐coil waveguide discharge for inner coating of metal tubes. Journal of Vacuum Science and Technology A: Vacuum Surfaces and Films 11 (5), S. 2508 - 2517 (1993)

Jacob, W.; Möller, W.: On the structure of thin hydrocarbon films. Applied Physics Letters 63 (13), S. 1771 - 1773 (1993)

Jacob, W.; Reinke, P.; Möller, W.: Ion energy distributions from electron cyclotron resonance methane plasmas. Diamond and Related Materials 2 (2-4), S. 378 - 382 (1993)

Keudell, A. v.; Möller, W.; Hytry, R.: Deposition of dense C:H films at elevated substrate temperature. Diamond and Related Materials 2 (2-4), S. 251 - 254 (1993)

Keudell, A. v.; Möller, W.; Hytry, R.: Deposition of dense hydrocarbon films from a nonbiased microwave plasma. Applied Physics Letters 62 (9), S. 937 - 939 (1993)

Möller, W.: Plasma and surface modeling of the deposition of hydrogenated carbon films from low-pressure methane plasmas. Applied Physics A - Materials Science & Processing 56 (6), S. 527 - 546 (1993)

Möller, W.: Plasma-Enhanced Chemical-Vapor-Deposition. Applied Physics A - Materials Science & Processing 56 (6), S. 469 - 469 (1993)

Möller, W.: Modelling and computer simulation of ion-beam- and plasma-assisted film growth. Thin Solid Films 228 (1-2), S. 319 - 325 (1993)

Reinke, P.; Jacob, W.; Moeller, W.: The Influence of the Ion Energy on the Growth and Structure of Thin Hydrocarbon Films. Journal of Applied Physics 74, 2, S. 1354 - 1361 (1993)

Reinke, P.; Jacob, W.; Möller, W.: Influence of the ion energy on the growth and structure of thin hydrocarbon films. Journal of Applied Physics 74 (2), S. 1354 - 1361 (1993)

Ullmann, J.; Wolf, G. K.; Möller, W.: Ion stimulated densification of amorphous carbon films. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, S. 1507 - 1510 (1993)